Solving Photolithography Challenges – SPIE Advanced Lithography 2010
Where the world's leading lithography technologists converge to share the latest in immersion lithography, EUV,
applications engineering and materials advancements.
Conference Dates
February 21 - 25, 2010
Exhibition Dates
Tuesday, February 23, 2010, 10:00 am – 5:00 pm
Wednesday, February 24, 2010, 10:00 am – 4:00 pm
Venue
San Jose Convention Center
San Jose, California, USA
Click here for more information on this event.
Please visit Entegris at Booth #120!
TECHNICAL PRESENTATIONS
Entegris will present its innovative solutions to help lithography engineers solve
their challenges related to microbridge defects, reticle haze defects, lens defects
and the EUV revolution.
Entegris Presentation
Reticle haze control: global update and technology roadmap
Paper 7638-43 of Conference 7638
Wednesday, February 24, 2010, 11:40 am
Entegris Poster Presentations
Considerations for chemical filter performance for low-molecular weight silicon AMC
Paper 7638-110 of Conference 7638
Tuesday, February 23, 2010, 6:00 pm
Further analysis of the effect of point-of-use filtration on microbridging defectivity
Paper 7639-65 of Conference 7639
Tuesday, February 23, 2010, 6:00 pm
Point-of-use filtration methods to reduce defectivity
Paper 7639-66 of Conference 7639
Tuesday, February 23, 2010, 6:00 pm
Defect performance of a 2X-node resist with a revolutionary point-of-use filter
Paper 7639-116 of Conference 7639
Tuesday, February 23, 2010, 6:00 pm
Poster Presentations Highlighting Entegris Technologies
Immersion lithography microbridge defects: characterization and root cause analysis
Paper 7638-69 of Conference 7638
Tuesday, February 23, 2010, 6:00 pm
Improving material-specific dispense processes for low-defect coatings
Paper 7639-98 of Conference 7639
Tuesday, February 23, 2010, 6:00 pm
Particle protection capability of SEMI® compliant EUV dual pod
Paper 7636-77 of Conference 7636
Wednesday, February 24, 2010, 6:00 pm
Product and Technology Highlights
- Impact® 5 nm asymmetric UPE and 10 nm Duo photochemical filters
- IntelliGen® Mini and HV photochemical dispense systems
- Clarilite® reticle haze prevention system
- Aeronex® Gas purification system
- Gatekeeper® point-of-use purifiers
- AMC Chemical Air Filters
- EUV-1000 reticle pod
- pHasor® II bubble-free gasification module
- Controlled DI water regasification system with pHasor® II
- Scanning mirrors